Parametric effects of residual stress in pulsed d.c. plasma enhanced CVD TiN coatings

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 1023-1027

  Ma, S ^a   Xu, K ^a   He, J ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Adhesion; Plasma enhanced chemical vapor deposition; Residual stress; TiN

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; TITANIUM; X RAY DIFFRACTION;

INDENTATION TEST;

COATING TECHNIQUES;

ADHESION; COATING; RESIDUAL STRESS; TITANIUM NITRIDE; VAPOR DEPOSITION; WEAR RESISTANCE;

EID: 0035386086     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01188-4     Document Type: Article

References (19)