Optimum oxygen concentration for the optoelectronic properties of IR sensitive VOx thin films

Optical Materials

Volumn 17, Issue 1-2, 2001, Pages 311-314

  Park, K M ^a   Yi, S ^a   Moon, S ^b   Im, S ^a  

^a Yonsei University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Phase transition; r.f. sputtering; Resistivity; TCR; VOx films; XRD

Indexed keywords

HEAT RESISTANCE; INFRARED RADIATION; OXYGEN; PHASE TRANSITIONS; SILICA; SPUTTER DEPOSITION; THIN FILMS; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

TEMPERATURE COEFFICIENT OF RESISTANCE (TCR);

OPTICAL FILMS;

EID: 0035361360     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(01)00053-2     Document Type: Conference Paper

References (8)