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Volumn 45, Issue 6, 2001, Pages 1003-1007

Fabrication and characterization of singly addressable arrays of polysilicon field-emission cathodes

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; FLAT PANEL DISPLAYS; GOLD; ION IMPLANTATION; METALLIC FILMS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; OXIDATION; POLYSILICON;

EID: 0035359994     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00054-5     Document Type: Article
Times cited : (8)

References (6)
  • 1
    • 0000988556 scopus 로고
    • Low-voltage silicon gated field-emission cathodes for vacuum microelectronics and e-beam applications
    • (1993) JVST B , vol.11 , Issue.2 , pp. 454-458
    • Trujillo, J.T.1    Hunt, C.E.2
  • 4
    • 0001611596 scopus 로고    scopus 로고
    • + polycrystalline silicon field emitter arrays for flat panel display applications
    • (1997) JVST B , vol.15 , Issue.2 , pp. 472-476
    • Uh, H.S.1    Kwon, S.J.2    Lee, J.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.