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Volumn , Issue , 1996, Pages 415-418
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New fabrication method of silicon field emitter array with local oxidation of polysilicon and chemical-mechanical-polishing
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Author keywords
[No Author keywords available]
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Indexed keywords
ANODES;
CHEMICAL POLISHING;
DIELECTRIC MATERIALS;
ELECTRIC CURRENT MEASUREMENT;
GATES (TRANSISTOR);
LEAKAGE CURRENTS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SINGLE CRYSTALS;
ANODE EMISSION CURRENT;
FIELD EMITTER ARRAYS (FEA);
FIELD EMISSION CATHODES;
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EID: 0030359014
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (5)
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References (5)
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