Characterization of an RF atomic nitrogen plasma source

Journal of Crystal Growth

Volumn 201, Issue , 1999, Pages 399-401

  Voulot, D ^a   McCullough, R W ^a   Thompson, W R ^a   Burns, D ^a   Geddes, J ^a   Cosimini, G J ^b   Nelson, E ^b   Chow, P P ^b   Klaassen, J ^b  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^b SVT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; DOPING (ADDITIVES); MOLECULAR BEAM EPITAXY; NITROGEN;

DISSOCIATION FRACTION;

PLASMA SOURCES;

EID: 0032690012     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)01361-X     Document Type: Article

References (2)

1. Donnelly A., Hughes M.P., Geddes J., Gilbody H.B. Meas. Sci. Technol. 3:1992;528.
2. Van Hove J.M., Cosimini G.J., Nelson E., Wowchak A.M., Chow P.P. J. Crystal Growth. 150:1995;908.