Near edge x-ray absorption fine structure spectroscopy study of atomic nitrogen implanted in Al2O3 by low energy N2+ bombardment

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 1024-1026

  Barranco, A ^a   Holgado, J P ^a   Yubero, F ^a   Espinos J P ^a   Martin A ^a   Gonzalez Elipe A R ^a  

^a UNIVERSITY OF SEVILLE   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ALUMINA; BINDING ENERGY; ION IMPLANTATION; PHOTOEMISSION; PHOTONS; ULTRAHIGH VACUUM; X RAY ANALYSIS;

NEAR EDGE FINE STRUCTURE (NEXAFS);

NITROGEN;

EID: 0035333411     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1355762     Document Type: Article

References (14)