Effect of the Ti-underlayer microstructure on the texture of Al thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 856-858

  Yoo, Sehoon ^a   Kim, Young Ho ^a   Yoon, Chong Seung ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTROMIGRATION; ELECTRON DIFFRACTION; EPITAXIAL GROWTH; FILM GROWTH; INTERFACIAL ENERGY; METALLOGRAPHIC MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; TEXTURES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

COLUMNAR STRUCTURES;

THIN FILMS;

EID: 0035326246     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1362681     Document Type: Conference Paper

References (11)

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