The effect of N+ ion energy on the properties of ion bombarded plasma polymer films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 175-177, Issue , 2001, Pages 594-598

  Rangel, Elidiane C ^a   Da Cruz, Nilson C ^a   Tabacniks, Manfredo H ^b   Lepienski, Carlos M ^c  

^a Laborat?rio de Plasmas e Aplica??es   (Brazil)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

^c FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

Electrical resistivity; Hardness; Ion implantation; Optical absorption; Plasma polymer

Indexed keywords

COMPOSITION EFFECTS; CROSSLINKING; HARDNESS; ION BOMBARDMENT; LIGHT ABSORPTION; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; ULTRAVIOLET SPECTROSCOPY;

NANOINDENTATION METHOD; PLASMA POLYMER FILMS;

PLASTIC FILMS;

EID: 0035303202     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00646-7     Document Type: Conference Paper

References (9)