Growth and characterization of shape memory alloy thin films for Si microactuator technologies

Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 4-6, 2001, Pages 323-326

  Yaakoubi, N ^a   Serre, C ^a   Martinez S ^a   Perez Rodriguez A ^a   Morante, J R ^a   Esteve, J ^b   Montserrat, J ^b   Dufour Gergam, E ^c   Granchamp, J P ^c   Bosseboeuf, A ^c   Frantz Rodriguez, N ^c  

^a UNIVERSITY OF BARCELONA   (Spain)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY MEASUREMENT; FILM GROWTH; MICROACTUATORS; NICKEL; OXIDATION; SEMICONDUCTING SILICON; SHAPE MEMORY EFFECT; SPECTROSCOPIC ANALYSIS; TITANIUM;

METAL INTERDIFFUSION VIA ANNEALING; SEQUENTIAL MULTILAYER DEPOSITION; VACUUM FURNACE;

THIN FILMS;

EID: 0035300061     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1011244327829     Document Type: Article

References (10)

1. Shape memory materials