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Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 4-6, 2001, Pages 351-355

Spectroscopic characteristics of SiO and SiO2 solid films: Assignment and local field effect influence

(4) Shaganov, I I a Perova, T S b Moore, R A b Berwick, K c

a VAVILOV STATE OPTICAL INSTITUTE (Russian Federation)

b TRINITY COLLEGE DUBLIN (Ireland)

c DUBLIN INSTITUTE OF TECHNOLOGY (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ELECTRON BEAMS; EVAPORATION; FILM GROWTH; INFRARED SPECTROSCOPY; INFRARED TRANSMISSION; MATHEMATICAL MODELS; PHONONS; REFLECTION; SPECTROSCOPIC ANALYSIS; THICKNESS MEASUREMENT; VACUUM APPLICATIONS;

ALUMINIZED GLASS TECHNIQUE; LOCAL FIELD EFFECT; OPTICAL PHONON SPLITTING;

SILICA;

EID: 0035299818 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1011256730555 Document Type: Article

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.