Reflection mode XAFS investigations of reactively sputtered thin films

Journal of Synchrotron Radiation

Volumn 8, Issue 2, 2001, Pages 478-480

  Lützenkirchen Hecht, Dirk ^a   Frahm, Ronald ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Reflection mode XAFS; Sn nitride; Sputter deposition; Ta oxide; Thin films

Indexed keywords

ARTICLE;

EID: 0035292414     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049500019701     Document Type: Article

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