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Volumn 55, Issue 3, 2001, Pages 257-266

Raman chemical imaging of microcrystallinity in silicon semiconductor devices

Author keywords

Chemical imaging; Ion implantation; Numerical confocai microscopy; Polysilicon; Raman imaging; Raman spectroscopy; Silicon semiconductors; Volumetric imaging

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; IMAGING TECHNIQUES; ION IMPLANTATION; MICROSCOPIC EXAMINATION; POLYSILICON; RAMAN SPECTROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

EID: 0035271641     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702011951867     Document Type: Article
Times cited : (13)

References (33)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.