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Volumn 55, Issue 3, 2001, Pages 257-266
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Raman chemical imaging of microcrystallinity in silicon semiconductor devices
a a a |
Author keywords
Chemical imaging; Ion implantation; Numerical confocai microscopy; Polysilicon; Raman imaging; Raman spectroscopy; Silicon semiconductors; Volumetric imaging
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Indexed keywords
ANNEALING;
CRYSTALLINE MATERIALS;
IMAGING TECHNIQUES;
ION IMPLANTATION;
MICROSCOPIC EXAMINATION;
POLYSILICON;
RAMAN SPECTROSCOPY;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DOPING;
NUMERICAL CONFOCAL MICROSCOPY;
RAMAN CHEMICAL IMAGING MICROSCOPES;
VOLUMETRIC IMAGING;
SEMICONDUCTING SILICON;
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EID: 0035271641
PISSN: 00037028
EISSN: None
Source Type: Journal
DOI: 10.1366/0003702011951867 Document Type: Article |
Times cited : (13)
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References (33)
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