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Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 1096-1099

Characterization of boron doped polycrystalline CVD diamond by ultra high vacuum scanning tunneling microscopy

(6) Kim, Y D a Choi, W a Wakimoto, H b Usami, S b Tomokage, H b Ando, T c

a Fukuoka Indust Sci Technol F (Japan)

b FUKUOKA UNIVERSITY (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; DOPING (ADDITIVES); ELECTRON EMISSION; GRAIN SIZE AND SHAPE; POLYCRYSTALLINE MATERIALS; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS;

CURRENT IMAGING TUNNELING SPECTROSCOPY (CITS);

DIAMONDS;

EID: 0033738962 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(99)00199-5 Document Type: Article

Times cited : (19)

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