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Applied Surface Science

Volumn 171, Issue 1-2, 2001, Pages 143-150

Interface diffusion and reaction between Cr layer and diamond particle during metallization

(4) Zhu, Yongfa a Wang, Li a Yao, Wenqing a Cao, Lili a

a TSINGHUA UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHROMIUM; DIAMONDS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; METALLIZING; SPUTTER DEPOSITION; THERMAL EFFECTS; VACUUM APPLICATIONS;

CARBIDE INTERLAYER; INTERFACE DIFFUSION;

DIFFUSION IN SOLIDS;

EID: 0035254092 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(00)00555-9 Document Type: Article

Times cited : (47)

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