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Volumn 26, Issue 2, 1997, Pages 90-96
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The optimization of the double mask system to minimize the contact resistance of a Ti/Pt/Au contact
a a a a a a b |
Author keywords
Contact resistance; Diamond; Metallization; Ohmic contact; Ti diffusion; Transmission line model
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Indexed keywords
DIFFUSION;
FABRICATION;
GOLD;
MASKS;
PHOTOLITHOGRAPHY;
PLATINUM;
SEMICONDUCTING DIAMONDS;
TITANIUM;
CONTACT RESISTANCE;
METALLIZATION;
TRANSMISSION LINE MODEL;
OHMIC CONTACTS;
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EID: 0031077517
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-997-0094-8 Document Type: Article |
Times cited : (2)
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References (8)
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