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Volumn 26, Issue 2, 1997, Pages 90-96

The optimization of the double mask system to minimize the contact resistance of a Ti/Pt/Au contact

Author keywords

Contact resistance; Diamond; Metallization; Ohmic contact; Ti diffusion; Transmission line model

Indexed keywords

DIFFUSION; FABRICATION; GOLD; MASKS; PHOTOLITHOGRAPHY; PLATINUM; SEMICONDUCTING DIAMONDS; TITANIUM;

EID: 0031077517     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0094-8     Document Type: Article
Times cited : (2)

References (8)
  • 5
    • 5844293464 scopus 로고    scopus 로고
    • private communication
    • Pehr Pehrrson, private communication.
    • Pehrrson, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.