Interfacial density of states in magnetic tunnel junctions

Physical Review Letters

Volumn 86, Issue 6, 2001, Pages 1066-1069

  LeClair, P ^a   Kohlhepp, J T ^a   Swagten, H J M ^a   De Jonge, W J M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTRIC CONDUCTANCE; ELECTRONIC STRUCTURE; FERMI LEVEL; MAGNETIC MATERIALS; MAGNETIC MOMENTS; MAGNETIZATION; MAGNETORESISTANCE; MAGNETRON SPUTTERING; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

CONDUCTANCE VOLTAGE CHARACTERISTICS; INTERFACIAL DENSITY OF STATES; KRAMERS-KRONIG ANALYSIS; MAGNETIC TUNNEL JUNCTIONS; ZERO BIAS ANOMALIES;

TUNNEL JUNCTIONS;

EID: 0035251630     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.1066     Document Type: Article

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