New laser-processed polysilicon TFT architecture

IEEE Electron Device Letters

Volumn 22, Issue 2, 2001, Pages 86-88

  Fulks, R T ^a   Ho, J ^a   Boyce, J B ^a  

^a PALO ALTO RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTALLIZATION; GATES (TRANSISTOR); LASER APPLICATIONS; LEAKAGE CURRENTS; LIQUID CRYSTAL DISPLAYS; POLYSILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

FIELD EFFECT MOBILITY; LASER CRYSTALLIZATION;

THIN FILM TRANSISTORS;

EID: 0035250587     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.902840     Document Type: Article

References (8)

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