SCOPUS 정보 검색 플랫폼

Volumn 20, Issue 3, 2001, Pages 277-280

Synthesis of mesoporous silica material with sodium hexafluorosilicate as silicon source under ultra-low surfactant concentration

(6) Wang, L a Tomura, S a Suzuki, M a Ohashi, F a Inukai, K a Maeda, M a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION ISOTHERMS; MESOPOROUS MATERIALS; SOLUTIONS; SURFACE ACTIVE AGENTS; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY POWDER DIFFRACTION;

HEXAFLUOROSILICATES;

SILICA;

EID: 0035247824 PISSN: 02618028 EISSN: None Source Type: Journal
DOI: 10.1023/A:1006761926695 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.