Preparation of silica-based mesoporous materials from fluorosilicon compounds: Gelation of H2SiF6 in ammonia surfactant solution

Journal of Colloid and Interface Science

Volumn 192, Issue 1, 1997, Pages 156-161

  Jeong, Soon Yong ^a   Suh, Jeong Kwon ^a   Lee, Jung Min ^a   Kwon, Oh Yun ^b  

^a Korea Research Institute of Chemical Technology   (South Korea)

^b Chonnam National University   (South Korea)

Author keywords

Fluorosilicon; Gelation; Mesoporous material

Indexed keywords

ORGANOFLUORINE DERIVATIVE; ORGANOSILICON DERIVATIVE;

ARTICLE; CHEMICAL COMPOSITION; DRUG MANUFACTURE; MATERIALS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PRIORITY JOURNAL; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 0031214057     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.1997.4974     Document Type: Article

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