Transformer coupled plasma etching for FPD manufacturing

Solid State Technology

Volumn 39, Issue 5, 1996, Pages 71-80

  Shih, Andrew H ^a,b   Demos, Alex ^a,c,d   Beer, Richard D ^a,e,f  

^a LAM RESEARCH CORPORATION   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF MICHIGAN   (United States)

^d Micron Semiconductor Italia   (Italy)

^e CVD Business Unit

^f TCP ^*

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA ETCHING; PLASMA SOURCES; THIN FILM DEVICES;

FLAT PANEL DISPLAYS;

DISPLAY DEVICES;

EID: 0030141561     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)

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2. T. Tsujmura, H. Kitahara, A. Makita, P. Fryer, J. Batey, "Low resistance gate Ine for high resolution TFT/LCD Display," 1994 International Display Research Conference Digest, Monterey, CA, 14:424-427 (Oct. 1994).
3. W. Yao, Verbal Communication (Jan, 1996).
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8. P.K. Shufflebotharm, R.A. Garriga, M.S. Barnes, "Electronic clamping of glass substraes in flat panael display etch equipment," 42nd Nat'l Symposium of the American Vacuum Society, Minneapoli, MN (Oct. 1995).
9. R. Gardner, J. Kiyota, I. Sugura, T. Hori, et al., 'Sputtering and dry etching of ITO films in LCD manufacturing," 1996 Display Manufacturing Technology Conference Digest. San Jose, CA, 3:69-70 (Feb. 1996).
10. H. Nonaka, Y. Fukino, K. Hara, M. Takeda, "Dry-etching of ITO film using HI gas for manufacturing AMI.CD," 1996 Display Manufacturing Technology Conference Digest, San Jose, CA, 3:87-88 (Feb. 1996).