Silicidation in chromium-amorphous silicon multilayer films

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 296-298

  Bouabellou, A ^a   Halimi, R ^a   Mirouh, K ^a   Labbani, R ^a   Djebien, R ^a   Mosser, A ^b  

^a Universite Mentouri Constantine   (Algeria)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHROMIUM; DIFFERENTIAL SCANNING CALORIMETRY; FILM GROWTH; FILM PREPARATION; INTERFACES (MATERIALS); MULTILAYERS; NUCLEATION; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

MONOCRYSTALLINES; SILICIDATION;

SEMICONDUCTING FILMS;

EID: 0035246767     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01572-8     Document Type: Article

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