Solid state reactions in cobalt/amorphous-silicon multilayer thin films

Thin Solid Films

Volumn 288, Issue 1-2, 1996, Pages 309-314

  Shim, Jae Yeob ^a   Kwak, Joon Seop ^a   Baik, Hong Koo ^a  

^a Yonsei University   (South Korea)

Author keywords

Cobalt; Multilayers; Silicon

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; AMORPHOUS SILICON; COBALT; CRYSTAL ATOMIC STRUCTURE; FILM GROWTH; NUCLEATION; PHASE TRANSITIONS; SEMICONDUCTOR GROWTH; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SILICIDE GROWTH; AMORPHOUS SILICON MULTILAYER THIN FILMS; CRYSTALLINE SILICIDE; EFFECTIVE DRIVING FORCE (EDF); EFFECTIVE HEAT OF FORMATION (EHF); SOLID STATE REACTIONS;

METALLIC SUPERLATTICES;

EID: 0030287177     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08849-9     Document Type: Article

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