Silicon Carbide Films by Laser Pyrolysis of Polycarbosilane

Journal of the American Ceramic Society

Volumn 84, Issue 1, 2001, Pages 224-226

  Colombo, Paolo ^a,b   Martucci, Alessandro ^c   Fogato, Oscar ^c   Villoresi, Paolo ^c  

^a UNIVERSITY OF BOLOGNA   (Italy)

^b Unita CISM GNSM Padova   (Italy)

^c UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ANNEALING; HIGH TEMPERATURE EFFECTS; LASER APPLICATIONS; OXIDATION; PYROLYSIS; RADIATION; SILANES; SUBSTRATES; THIN FILMS;

LASER PYROLYSIS; LASER RADIATION ABSORPTION; POLYCARBOSILANE;

SILICON CARBIDE;

EID: 0035241532     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00636.x     Document Type: Article

References (9)

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