Elimination of silicon hillocks using an alkaline complexant etching system

International Journal of Inorganic Materials

Volumn 3, Issue 8, 2001, Pages 1173-1176

  Moldovan, Carmen ^a   Iosub, Rodica ^a   Modreanu, Mircea ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

Anisotropic etching; Complexant system; Hillocks elimination

Indexed keywords

LITHIUM DERIVATIVE; POTASSIUM HYDROXIDE; SILICON; SODIUM HYDROXIDE; WATER;

ALKALINITY; ANISOTROPY; CONDUCTANCE; CONFERENCE PAPER; ELECTROCHEMISTRY; ELECTROLYSIS; HYDROPHILICITY; HYDROPHOBICITY; IMPEDANCE; SCANNING ELECTRON MICROSCOPY;

EID: 0035208614     PISSN: 14666049     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1466-6049(01)00117-9     Document Type: Conference Paper

References (7)

1. Surface quality of {111} side walls in KOH etched cavities
2. Silicon hillocks elimination using a complexant redox alkaline system