Phase defect inspection by differential interference

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue , 2001, Pages 543-554

  Ogawa, K ^a   Kodama, J ^a   Machida, K ^a   Nakashima, K ^a   Watakabe, Y ^a  

^a Yokohama shi   (Japan)

Author keywords

Alternating phase shifting mask; Differential interference; Nomarski prism; Phase defect; Photomask inspection

Indexed keywords

ARGON; COMPUTER SIMULATION; INTERFEROMETERS; LASERS; LIGHT INTERFERENCE; LIGHT REFLECTION; LIGHT TRANSMISSION; MASKS; OPTICS; PRISMS;

ALTERNATING PHASE SHIFTING MASK; DIE TO DIE COMPARISON METHOD; DIFFERENTIAL INTERFERENCE; PHASE DEFECT INSPECTION; PHOTOMASK PATTERN INSPECTION; SHEARING DETECTION;

PHOTOLITHOGRAPHY;

EID: 0035184626     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.438389     Document Type: Conference Paper

References (3)

1. Phase defects on DUV alternating PSMs
2. Detection and repair of multiphase defects on alternating phase-shift masks for DUV lithography
3. Establishment of production process and assurance method for alternating phase-shift masks