Phase defects on DUV alternating PSMs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 661-670

  Yoneda, Ikuo ^a   Kanai, Hideki ^a   Yamaguchi, Shinji ^a   Higashikawa, Iwao ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; FITS AND TOLERANCES; INSPECTION; INTEGRATED CIRCUIT TESTING; KRYPTON; LOGIC DESIGN; LOGIC GATES; PHASE SHIFTERS; PHOTOLITHOGRAPHY; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY; SPECIFICATIONS;

CRITICAL DIMENSION ERROR; LOGIC GATE PATTERN; PHASE DEFECTS; PHASER SHIFT MASK TECHNOLOGY;

MASKS;

EID: 0033666177     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392097     Document Type: Conference Paper

References (3)