Defect dispositioning using mask printability on attenuated phase shift production photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 488-498

  Novak, Justin ^a   Eynon, Ben ^a   Rosenbusch, Anja ^b   Goldenshtein, Alex ^c  

^a PHOTRONICS INC   (United States)

^b an Applied M aterials company   (United States)

^c an Applied M aterials company   (Israel)

Author keywords

Defect analysis; Defect classification; Mask inspection; Printability study

Indexed keywords

ATTENUATION; COMPUTER SIMULATION; DEFECTS; INSPECTION; MASKS; PHASE SHIFT; REPAIR; SCANNING ELECTRON MICROSCOPY;

DEFECT DISPOSITIONING; MASK PRINTABILITY; MASK REPAIR CYCLE; PHOTOMASKS; SOFTWARE PACKAGE AERIAL IMAGE MEASUREMENT SYSTEM; SOFTWARE PACKAGE VIRTUAL STEPPER SIMULATOR; THROUGH-FOCUS ANALYSIS;

PHOTOLITHOGRAPHY;

EID: 0035184624     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438407     Document Type: Article

References (4)

1. Comparison of binary mask defect printability analysis using virtual stepper system and aerial image measurement system
2. A comparison of software and physical simulation tools on an embedded-attenuated phase shift mask
3. High transmission PSM inspection sensitivity
4. Defect depositioning using mask printability on attenuated phase shift production photomask