UV inspection of EUV and SCALPEL reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 241-249

  Pettibone, D W ^a   Bareket, N ^a   Liang, T ^a   Stivers, A R ^a   Hector, S D ^a   Mangat, P J S ^a   Resnick, D J ^a   Lercel, M ^a   Lawliss, M ^a   Magg, C ^a   Novembre, A ^a   Farrow, R ^a  

^a NONE

Author keywords

Defects; EUV; Mask inspection; Next Generation Lithography; NGL; PREVAIL; SCALPEL; Stencil mask

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; IMAGE ANALYSIS; LIGHT REFLECTION; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

NEXT GENERATION LITHOGRAPHY (NGL) RETICLES;

MASKS;

EID: 17744388565     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410699     Document Type: Conference Paper

References (6)

1. The scalpel lithography system
2. PREVAIL - IBM's E-Beam Technology for Next Generation Lithography
3. EUV lithography - The successor to optical lithography?