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Volumn 30, Issue 1, 2001, Pages L1-L5

High conductivity copper-boron alloys obtained by low temperature annealing

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; PRECIPITATION (CHEMICAL); THERMAL EFFECTS;

EID: 0035151776     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-001-0215-8     Document Type: Article
Times cited : (8)

References (10)
  • 2
    • 0001318002 scopus 로고    scopus 로고
    • J.M.E. Harper and K.P. Rodbell, J. Vac. Sci. Technol. B15, 763 (1997); J.M.E. Harper, C. Cabral Jr., P.C. Andricacos, L. Gignac, I.C. Noyan, K.P. Rodbell, and C.K. Hu, J. Appl. Phys. 86, 2516 (1999).
    • (1997) J. Vac. Sci. Technol. , vol.B15 , pp. 763
    • Harper, J.M.E.1    Rodbell, K.P.2
  • 9
    • 0004738016 scopus 로고
    • Washington, D.C.: Diffusion in Metals Data Center, Metallurgy Division, Institute for Materials Research, National Bureau of Standards
    • D.B. Butrymowicz, Diffusion Rate Data and Mass Transport Phenomena for Copper Systems - Part II (Washington, D.C.: Diffusion in Metals Data Center, Metallurgy Division, Institute for Materials Research, National Bureau of Standards, 1981), p. 174.
    • (1981) Diffusion Rate Data and Mass Transport Phenomena for Copper Systems - Part II , pp. 174
    • Butrymowicz, D.B.1
  • 10
    • 0004738016 scopus 로고
    • Washington, D.C.: Diffusion in Metals Data Center, Metallurgy Division, Institute for Materials Research, National Bureau of Standards
    • D.B. Butrymowicz, J.R. Manning, and M.E. Read, Diffusion Rate Data and Mass Transport Phenomena for Copper Systems (Washington, D.C.: Diffusion in Metals Data Center, Metallurgy Division, Institute for Materials Research, National Bureau of Standards, 1981), pp. 19, 145.
    • (1981) Diffusion Rate Data and Mass Transport Phenomena for Copper Systems , pp. 19
    • Butrymowicz, D.B.1    Manning, J.R.2    Read, M.E.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.