In situ cleaning of GaN/6H-SiC substrates in NH3

Journal of Crystal Growth

Volumn 222, Issue 3, 2001, Pages 452-458

  McGinnis, A J ^a   Thomson, D ^a   Davis, R F ^a   Chen, E ^a   Michel, A ^a   Lamb, H H ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ANNEALING; CARBON; CHEMICAL CLEANING; DESORPTION; IN SITU PROCESSING; OXYGEN; SEMICONDUCTOR DOPING; SILICON CARBIDE; SUBSTRATES; SURFACE ROUGHNESS;

GALLIUM NITRIDE;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 0035151542     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00947-7     Document Type: Article

References (15)

1. Kern W. J. Electrochem. Soc. 137:1990;1887.
2. Sanganeria M.K., Ozturk M.C., Harris G., Violette K.E., Ban I., Lee C.A., Maher D.M. J. Electrochem. Soc. 142:1995;3961.
3. Hossain S.D., Pantano C.G., Ruzyllo J. J. Electrochem. Soc. 137:1990;3287.
4. Ploog K. Freyhardt H.C. Crystals: Growth Properties, and Applications. Vol. 3:1980;75-162 Spring, Berlin.
5. R. Williams, Modern GaAs Processing Methods, Artech House, Norwood, MA, 1990 (Chapters 2 and 4).
6. Hughes W.C., Rowland W.J. Jr., Johnson M.A.L., Fujita S., Cook J.W. Jr., Schetzina J.F., Ren J., Edmond J.A. J. Vac. Sci. Technol. B. 13:1995;1571.
7. Tarsa E.J., Heying B., Wu X.H., Fini P., DenBaars S.P., Speck J.S. J. Appl. Phys. 82:1997;5472.
8. Pavlovska A., Torres V.M., Bauer E., Doak R.B., Tsong I.S.T., Thomson D.B., Davis R.F. Appl. Phys. Lett. 75:1999;989.
9. Cheng T.S., Novikov S.V., Lebedev V.B., Campion R.P., Jeffs N.J., Melnik Yu.V., Tsvetkov D.V., Stepanov S.I., Cherenkov A.E., Dmitriev V.A., Korakakis D., Hughes O.H., Foxon C.T. J. Crystal Growth. 197:1999;12.
10. King S.W., Barnak J.P., Bremser M.D., Tracy K.M., Ronning C., Davis R.F., Nemanich R.J. J. Appl. Phys. 84:1998;5248.
11. Eric Chen, M.S. Thesis, Department of Chemical Engineering, North Carolina State University, 1998.
12. Sitar Z., Smith L.L., Davis R.F. J. Crystal Growth. 141:1994;11.
13. Munir Z.A., Searcy A.W. J. Chem. Phys. 42:1965;4223.
14. Held R., Crawford D.E., Johnston A.M., Dabiran A.M., Cohen PI. Surf. Rev. Lett. 5:1998;913.
15. J. Chastain (Ed.), XPS Handbook, Perkin Elmer, Eden Prairie, MN, 1996.