Study of structure and optical properties of β-FeSi2 precipitates formed by ion-implantation of Fe+ in Si(100) and effects of co-implantation of Fe+ and Si+ in amorphous SiO2

Thin Solid Films

Volumn 381, Issue 2, 2001, Pages 194-201

  Oyoshi, K ^a   Lenssen, D ^a   Carius, R ^a   Mantl, S ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ENERGY GAP; ION IMPLANTATION; PHOTOLUMINESCENCE; PRECIPITATION (CHEMICAL); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PHOTOTHERMAL DEFLECTION SPECTROSCOPY (PDS); RUTHERFORD BACKSCATTERING SPECTROMETRY (RBS); TRANSMISSION ELECTRON DIFFRACTION (TED);

SEMICONDUCTING FILMS;

EID: 0035151392     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01743-0     Document Type: Article

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