Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

Materials Letters

Volumn 47, Issue 1-2, 2001, Pages 89-94

  Watanabe, Akira ^a   Unno, Masashi ^a   Hojo, Fusao ^b   Miwa, Takao ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYING; HEAT TREATMENT; RAMAN SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS;

MICRO-RAMAN SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0035147896     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(00)00217-2     Document Type: Article

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