Laser-ablated plasma for deposition of aluminum oxide films

Applied Surface Science

Volumn 143, Issue 1, 1999, Pages 56-66

  Misra, A ^a   Thareja, R K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CAMERAS; CHARGE COUPLED DEVICES; DEPOSITION; LASER ABLATION; OXYGEN; PHOTOGRAPHY; PLASMAS; PRESSURE;

ALUMINUM OXIDE FILMS; FAST PHOTOGRAPHY; INTEGRATED CHARGED COUPLE DEVICE CAMERA SYSTEM; PLASMA PARAMETERS; PULSED LASER DEPOSITION;

METALLIC FILMS;

EID: 0032687285     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00930-1     Document Type: Article

References (43)

1. D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994.
2. Smith H.M., Turner A.F. Appl. Opt. 4:1965;147.
3. J.F. Ready, Effects of High Power Laser Radiation, Academic Press, New York, 1971.
4. Muenchausen R.E., Hubbard K.M., Foltyn S., Estler R.C., Nogar N.S., Jenkins C. Appl. Phys. Lett. 56:1990;578.
5. Kidoh H., Morimoto A., Shimizu T. Appl. Phys. Lett. 59:1991;237.
6. Koren G., Baseman R.J., Gupta A., Lutwyche M.I., Laibwitz R.B. Appl. Phys. Lett. 56:1990;2144.
7. H.-U. Habermeier, in: E. Fogarassy, S. Lazzare (Eds.), Laser Ablation of Electronic Materials, 1992, p. 281.
8. Ganzalo J., Vega F., Afonso C.N. J. Appl. Phys. 77:1995;6588.
9. K.L. Saenger, in: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 582.
10. Hall R.B. J. Appl. Phys. 40:1969;1941.
11. Geohegan D.B. Appl. Phys. Lett. 60:1992;2732.
12. Geohegan D.B., Puretzky A.A. Appl. Phys. Lett. 67:1995;197.
13. Dyer P.E., Issa A., Key P.H. Appl. Phys. Lett. 57:1990;186.
14. Dyer P.E., Key P.H., Sands D., Snelling H.V., Wagner F.X. Appl. Surf. Sci. 86:1995;18.
15. Kools J.C.S. J. Appl. Phys. 74:1993;6401.
16. Lindley R.A., Gilgenbach R.M., Chung C.H., Lash J.S., Doll G.L. J. Appl. Phys. 76:1996;5457.
17. Aden M., Beyer E., Herziger G. J. Phys. D: Appl. Phys. 23:1991;655.
18. Kim H.S., Kwok H.S. Appl. Phys. Lett. 61:1992;2234.
19. B. Geohegan, in: E. Fogarassy, S. Lazzare (Eds.), Laser Ablation of Electronics Materials, Elsevier, 1992, p. 73.
20. Dyer P.E., Sidhu J. J. Appl. Phys. 64:1986;4657.
21. Wanniarachchi K., Kumuduni A., Nakayama Y., Nakata Y., Okada T., Maeda M. J. Appl. Phys. 74:1993;7510.
22. Berardi V., Amoruso S., Spinelli N., Armenante M., Velotta R., Fuso F., Allegrini M., Arimondo E. J. Appl. Phys. 76:1994;8077.
23. Thareja R.K., Dwivedi R.K. Phys. Lett. A. 222:1996;199.
24. Björmander C., Grishin A.M., Moon B.M., Lee J., Rao K.V. Appl. Phys. Lett. 64:1994;3646.
25. Gu J.Y., Kim K.H., Noh T.W., Suh K.-S. J. Appl. Phys. 78:1995;6151.
26. Dhillon R.O., Woolman J.A., Katkanant V. Phys. Rev. B. 29:1984;3482.
27. Qain F., Nagabushnam V., Singh R.K. Appl. Phys. Lett. 63:1993;317.
28. Som T., Dhar S., Minwalla S.N., Kulkarni V.N. Nucl. Instr. and Meth. B. 122:1997;244.
29. Thareja R.K., Dwivedi R.K., Abhilasha Phys. Rev. B. 55:1997;2600.
30. Ozegowski M., Metev S., Sepold G. Appl. Surf. Sci. 127-129:1998;614.
31. Yakolev V.A., Mattei G., Lembo A., Fuso F., Arimondo E., Allegrini M., Leccabue F., Watts B.E. J. Appl. Phys. 78:1995;6321.
32. Labardi M., Allegrini M., Leccabue F., Watts B.E., Ascoli C., Frediani C. Solid State Commun. 91:1994;59.
33. Neogi A., Mishra A., Thareja R.K. J. Appl. Phys. 83:1998;2831.
34. Kools J.C.S., Baller T.S., De Zwart S.P., Dieleman J. J. Appl. Phys. 71:1992;4547.
35. Singh R.K., Narayan J. Phys. Rev. B. 41:1990;8843.
36. Singh R.K., Holland O.W., Narayan J. J. Appl. Phys. 68:1990;233.
37. Ya. B. Zel'dovich, Yu. P. Raizer, in: Physics of Shock waves and High Temperature Hydrodynamic Phenomenon, Academic Press, New York, 1996, p. 94.
38. Fukushima K., Badaye M., Morishita T. J. Appl. Phys. 79:1996;3697.
39. M.A. Liberman, A.L. Velikovich, Physics of Shock Waves in Gases and Plasmas, Springer-Verlag, Berlin, 1986.
40. C.D. Hodgman, R.C. Weast, R.S. Shankland (Eds.), Handbook of Chemistry and Physics, The Chemical Rubber Co., OH, 1964.
41. Cheung N.H., Ying Q.Y., Zheng J.P., Kwok H.S. J. Appl. Phys. 69:1991;6349.
42. Chang J.J., Warner B.E. Appl. Phys. Lett. 69:1996;473.
43. K.P. Huber, G. Herzberg, Molecular Spectra and Molecular Structure-Constants of Diatomic Molecules, Van Nostrand-Reinhold, New York, 1979.