SCOPUS 정보 검색 플랫폼

Volumn 201, Issue 2, 2001, Pages 238-249

Microstructure, toughness and flexural strength of self-reinforced silicon nitride ceramics doped with yttrium oxide and ytterbium oxide

(5) Zheng, Y S a Knowles, K M b Vieira, J M b Lopes, A B a Oliveira, F J a,b,c

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b UNIVERSITY OF AVEIRO (Portugal)

c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Hong Kong)

Author keywords

Amorphous film; Crack length; Dislocations; Grain boundary; Self reinforcement; Silicon nitride; Toughness; Ytterbium oxide; Yttrium oxide

Indexed keywords

AMORPHOUS FILMS; CERAMIC MATERIALS; CRACKS; FRACTURE TOUGHNESS; GRAIN BOUNDARIES; HEAT TREATMENT; REINFORCEMENT; SILICON NITRIDE; YTTRIUM OXIDE;

CRACK LENGTH; DISLOCATION; GRAIN-BOUNDARIES; INTERGRANULAR PHASE; PRESSURELESS-SINTERED; R-CURVE BEHAVIOR; SELF REINFORCED; SELF-REINFORCEMENT; SILICON NITRIDE CERAMICS; STRENGTH AND TOUGHNESS;

DUCTILE FRACTURE;

SILICON NITRIDE; YTTERBIUM; YTTRIUM;

ARTICLE; CERAMICS; CHEMICAL STRUCTURE; ELECTRON MICROSCOPY; HEATING; PHYSICAL PHASE; PRIORITY JOURNAL; STRUCTURE ANALYSIS;

EID: 0035089504 PISSN: 00222720 EISSN: None Source Type: Journal
DOI: 10.1046/j.1365-2818.2001.00839.x Document Type: Article

Times cited : (26)

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