Novel technique to pattern silver using CF4 and CF4/O2 glow discharges

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 1, 2001, Pages 158-165

  Nguyen, Phucanh ^a   Zeng, Yuxiao ^a   Alford, T L ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FLUOROCARBONS; GLOW DISCHARGES; LOW TEMPERATURE EFFECTS; METALLIZING; PLASMA APPLICATIONS; PRESSURE EFFECTS; REMOVAL; SILVER; SPUTTERING; SURFACE ROUGHNESS; THIN FILMS;

RESIST STRIP PROCESSES; SURFACE ATOMIC CONCENTRATION;

METALLIC FILMS;

EID: 0035078373     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1333080     Document Type: Article

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