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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 1, 2001, Pages 183-187

Studies of pulsed laser deposition mechanism of WO3 thin films

(2) Qiu, H a Lu, Y F a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

Gas reaction; Optical emission spectroscopy; Pulsed laser deposition; Raman spectroscopy; Surface oxidation

Indexed keywords

EMISSION SPECTROSCOPY; OXIDATION; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; THIN FILMS; TUNGSTEN COMPOUNDS;

MONOCLINIC PHASE TARGETS;

SEMICONDUCTING FILMS;

EID: 0035072485 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.40.183 Document Type: Article

Times cited : (3)

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