Laser microprocessing and the applications in microelectronics industry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4157, Issue , 2001, Pages 191-199

  Lu, Y F ^a   Ren, Z M ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Laser bumping; Laser cleaning; Laser microprocessing; Laser nanoprocessing; Laser texturing

Indexed keywords

CLEANING; ETCHING; MICROELECTRONIC PROCESSING; PHOTOLITHOGRAPHY; REAL TIME SYSTEMS; SURFACE CHEMISTRY; TEXTURING;

LASER CLEANING; LASER MICROPROCESSING; LASER TEXTURING;

LASER APPLICATIONS;

EID: 0035062117     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.413755     Document Type: Conference Paper

References (10)

1. A theoretical model for laser removal of particles from solid surface
2. A cleaning model for removal of particles due to laser-induced thermal stress in substrate
3. A theoretical model for laser cleaning of microparticles in a thin liquid layer
4. Laser cleaning of tiny particles in a thin liquid layer and its theoretical model
5. Optical emission spectrum analyses during pulsed laser deflash of integrated circuit packages
6. Laser induced deformation on hard disk surface
7. Laser plasma interaction at early stage of laser ablation
8. Laser-induced periodic structures at silicon-dioxide/silicon and silicon-dioxide interfaces
9. Laser-induced nanooxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip
10. Nanostructure fabrication using pulsed lasers in combination with a scanning tunneling microscope: Mechanism investigation