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Volumn 36, Issue 10 PART A, 1997, Pages
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A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface
a a a a a a |
Author keywords
Adhesion force; Cleaning force; Cleaning model; Cleaning threshold; Laser cleaning; Particle removal; Quartz particle; Silicon substrate
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Indexed keywords
ADHESION;
LASER BEAM EFFECTS;
MATHEMATICAL MODELS;
PARTICLES (PARTICULATE MATTER);
PULSED LASER APPLICATIONS;
QUARTZ;
SILICON;
SUBSTRATES;
THERMAL EXPANSION;
VAN DER WAALS FORCES;
LASER FLUENCE;
SURFACE CLEANING;
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EID: 0031247453
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.l1304 Document Type: Article |
Times cited : (33)
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References (13)
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