Dry etch yield enhancement by use of after-develop inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 108-116

  Kalk, F ^a   Brankner, K ^a   Peters, L ^a   Vacca, A ^a   Pomeroy, S ^a   Emery, D ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DEFECTS; DRY ETCHING; INSPECTION; INTEGRATED CIRCUIT MANUFACTURE; INTEGRATED CIRCUIT TESTING; PHOTORESISTS;

AFTER DEVELOP INSPECTION; MASK ERROR ENHANCEMENT FACTORS;

MASKS;

EID: 0033320002     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373306     Document Type: Conference Paper

References (6)