Oxidation mechanism of ultra thin TiN films prepared by an advanced ion-plating method

Materials Transactions

Volumn 42, Issue 3, 2001, Pages 403-406

  Uetani, K ^a   Kajiyama, H ^a   Takagi, A ^a   Tokomoto, I ^a   Koizumi, Y ^a   Nose, K ^a   Ihara, Y ^a   Kato, A ^a   Onisawa, K I ^a   Minemura, T ^a  

^a ShinMaywa Industries Ltd   (Japan)

Author keywords

Advanced ion plating; Oxidation; Resistivity change; Titanium nitride; X ray photoelectron spectroscopy

Indexed keywords

BINDING ENERGY; CRYSTAL ORIENTATION; DEPOSITION; ELECTRIC CONDUCTIVITY; OXIDATION; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ADVANCED ION PLATING (AIP);

ULTRATHIN FILMS;

EID: 0034990024     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.42.403     Document Type: Article

References (12)