Ultra thin TiN films prepared by an advanced ion-plating method

Materials Transactions, JIM

Volumn 41, Issue 9, 2000, Pages 1161-1163

  Uetani, Kazuo ^a   Kajiyama, Hiroshi ^b   Yamaguchi, Tomoko ^a   Nose, Koichi ^a   Onisawa, Ken Ichi ^b   Minemura, Tetsuroh ^b  

^a ShinMaywa Industries Ltd   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITORS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC POTENTIAL; FILM PREPARATION; MORPHOLOGY; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM NITRIDE; ULTRATHIN FILMS;

ADVANCED ION PLATING (AIP) METHOD;

AMORPHOUS FILMS;

EID: 0034266773     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.41.1161     Document Type: Article

References (8)

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