Development of a silicon-based nanoprobe system for 3-d measurements

CIRP Annals - Manufacturing Technology

Volumn 50, Issue 1, 2001, Pages 365-368

  Haitjema, H ^a   Pril, W O ^b   Schellekens, P H J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ASML   (Netherlands)

Author keywords

CMM probe; MEMS; Silicon

Indexed keywords

COORDINATE MEASURING MACHINES; ELASTIC MODULI; ETCHING; HINGES; INTEGRATED CIRCUITS; INTERFEROMETRY; PIEZOELECTRICITY; PROBES; SILICON SENSORS; STRAIN GAGES;

LASER INTERFEROMETRY; NANOPROBE SYSTEM;

MICROELECTROMECHANICAL DEVICES;

EID: 0034952825     PISSN: 00078506     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0007-8506(07)62141-6     Document Type: Article

References (9)

1. Accuracy limitations of fast mechanical probing
2. Development of a 2D probing system with nanometer resolution
3. Design for a compact High-Accuracy CMM
4. Development of a traceable laser-based displacement calibration system with nanometric accuracy
5. Design and calibration of a parallel-moving displacement generator for nanometrology
6. Calibration of displacement sensors up to 300 μm with nanometre accuracy and direct traceability to a primary standard of length