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International Journal of Inorganic Materials

Volumn 3, Issue 4-5, 2001, Pages 357-366

Vanadium and tellurium siloxane compounds as precursors of vanadium oxide and tellurium oxide silica materials

(5) Haoudi, A a,b Dhamelincourt, P a Mazzah, A a Drache, M c Conflant, P c

a UNIVERSITÉ DES SCIENCES ET TECHNOLOGIES DE LILLE (France)

b SIDI MOHAMED BEN ABDELLAH UNIVERSITY (Morocco)

c UNITÉ DE CATALYSE ET DE CHIMIE DU SOLIDE (France)

Author keywords

A. amorphous materials; B. chemical synthesis; C. Raman spectroscopy; D. nuclear magnetic resonance (NMR)

Indexed keywords

SILICON DIOXIDE; SILOXANE; TELLURIUM DERIVATIVE; VANADIUM DERIVATIVE;

ARTICLE; DIFFERENTIAL SCANNING CALORIMETRY; MATERIALS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; THERMOGRAVIMETRY; X RAY DIFFRACTION;

EID: 0034931004 PISSN: 14666049 EISSN: None Source Type: Journal
DOI: 10.1016/S1466-6049(01)00028-9 Document Type: Article

Times cited : (5)

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