|
Volumn 63, Issue 20, 2001, Pages 2052051-20520514
|
Tight-binding molecular dynamics study of vacancy-interstitial annihilation in silicon
a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
SILICON;
ARTICLE;
COMPUTER SIMULATION;
ENERGY;
MOLECULAR DYNAMICS;
SEMICONDUCTOR;
TEMPERATURE;
|
EID: 0034904750
PISSN: 01631829
EISSN: None
Source Type: Journal
DOI: 10.1103/physrevb.63.205205 Document Type: Article |
Times cited : (16)
|
References (28)
|