SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 649, Issue , 2001, Pages

Finite element modeling of nanoindentation measurements of crystalline and amorphous Si

(4) Knapp, J A a Follstaedt, D M a Myers, S M a Petersen, G A a

a SANDIA NATIONAL LABORATORIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DUCTILITY; ELASTIC MODULI; ELASTOPLASTICITY; ELECTRON MICROSCOPY; FINITE ELEMENT METHOD; HARDNESS; ION IMPLANTATION; MATHEMATICAL MODELS; PHASE TRANSITIONS;

ELASTIC PLASTIC SOLIDS; MISES YIELD CRITERION; NANOINDENTATION MEASUREMENTS;

INDENTATION;

EID: 0034862193 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (9)

References (11)

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2
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4
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- Knapp, J.A.¹ Follstaedt, D.M.² Myers, S.M.³ Barbour, J.C.⁴ Friedmann, T.A.⁵

5
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- (1998) Phys. Rev. , vol.58 B , pp. 8941
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7
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- to be published
- Mat. Res. Soc. Symp. Proc. , vol.557
- Follstaedt, D.M.¹ Knapp, J.A.² Myers, S.M.³ Petersen, G.A.⁴

8
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9
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- All of the indentation tests were performed at the MTS Systems Corp., Knoxville, TN

10
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11
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- Hirth, J.P.¹ Lothe, J.²

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