Laser conditioning characterization and damage threshold prediction of hafnia/silica multilayer mirrors by photothermal microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4347, Issue 1, 2001, Pages 53-61

  Papandrew, A B ^b   Stolz, C J ^a   Wu, Z L ^c   Loomis, G E ^a   Falabella, S ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b California Institute of Technology   (United States)

^c Oplink Communications Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; LASER DAMAGE; MULTILAYERS; OPTICAL COATINGS; PHYSICAL VAPOR DEPOSITION; SILICA;

LASER CONDITIONING; PHOTOTHERMAL MICROSCOPY;

MIRRORS;

EID: 0034857223     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.425049     Document Type: Article

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