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Volumn 11, Issue 3, 2001, Pages

Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; FILM PREPARATION; GRAIN SIZE AND SHAPE; PHASE TRANSITIONS; THIN FILMS;

EID: 0034848811     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:20013144     Document Type: Conference Paper
Times cited : (4)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.