Behavior of fused silica irradiated by low level 193nm excimer laser for tens of billions of pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4347, Issue 1, 2001, Pages 177-186

  Van Peski, C K ^a   Bor, Z ^b   Embree, T ^b   Morton, R ^b  

^a SEMATECH   (United States)

^b CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; DISTORTION (WAVES); EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRRADIATION; LASER PULSES; WAVEFRONTS;

WAVEFRONT DISTORTION;

FUSED SILICA;

EID: 0034847798     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.425033     Document Type: Article

References (6)

1. Excimer-laser-induced densification of fused silica: Laser-fluence and material-grade effects on the scaling law
2. Densification of synthetic fused silica under ultraviolet irradiation
3. Testing of optical materials for 193nm applications
4. Behavior of fused silica irradiated by low level 193nm excimer laser for tens of millions of pulses
5. The mechanism of radiation-induced compaction in vitreous silica