(HFA)Cu·1,5-COD as the prospective precursor for CVD-technologies: The electronic structure, thermodynamical properties and process of formation of thin copper films

Journal De Physique. IV : JP

Volumn 11, Issue 3, 2001, Pages

  Liskovskaya, T I ^a   Bulusheva, L G ^a   Okotrub, A V ^a   Krupoder, S A ^a   Semyannikov, P P ^a   Asanov, I P ^a   Igumenov, I K ^a   Manaev, A V ^a   Traven, V F ^a   Cherkov, A G ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRON ENERGY LEVELS; ELECTRONIC STRUCTURE; MICROELECTRONICS; PHOTOELECTRON SPECTROSCOPY; PROBABILITY DENSITY FUNCTION; THERMODYNAMIC PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

THERMOLYSIS;

THIN FILMS;

EID: 0034846980     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:2001309     Document Type: Conference Paper

References (22)