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Volumn 126, Issue 3-4, 1998, Pages 303-308
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XPS studies of copper deposition from 1,5-cyclooctadiene-copper(I)-hexafluoroacetylacetonate on Si(111)
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Author keywords
Chemical vapour deposition; Copper; Copper organometallic precursor; Metal semiconductor interfaces; Metallic films; Photoelectron emission; Silicon; X ray photoelectron spectroscopy
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Indexed keywords
CARBIDES;
CHEMICAL VAPOR DEPOSITION;
COPPER;
DECOMPOSITION;
DISSOCIATION;
INTERFACES (MATERIALS);
METALLIC FILMS;
PHOTOEMISSION;
SILICON;
THERMAL EFFECTS;
X RAY PHOTOELECTRON SPECTROSCOPY;
COPPER ORGANOMETALLIC PRECURSOR;
METAL SEMICONDUCTOR INTERFACE;
PHOTOELECTRON EMISSION;
SURFACES;
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EID: 0032473781
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(97)00583-7 Document Type: Article |
Times cited : (12)
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References (15)
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